Aberration retrieval for high-NA optical systems using the extended Nijboer-Zernike theory

Peter Dirksen; Joseph J.M. Braat; Augustus J.E.M. Janssen; Ad Leeuwestein

doi:10.1117/12.597406

12 May 2005 Aberration retrieval for high-NA optical systems using the extended Nijboer-Zernike theory

Peter Dirksen, Joseph J.M. Braat, Augustus J.E.M. Janssen, Ad Leeuwestein

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.597406
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Previously, we have given a detailed description of the so-called Extended Nijboer-Zernike approach and its application to aberration measurements of the optical projection system in a wafer scanner in the case of a low or medium high-NA system. The Extended Nijboer-Zernike theory provides an analytical description of the through-focus intensity point-spread function in the presence of lens aberrations and defocus. Taking the Extended Nijboer-Zernike description for the electric field components in the case of a high-NA optical system as a starting point, we present an approach to aberration retrieval when the NA is very high. The experimental procedure involves the analysis of a focus-exposure matrix. The differences between aberration retrieval using the low-NA scalar model and the high-NA full vectorial model are discussed. The mathematical framework is shown and the experimental procedure to extract aberrations for a high-NA lens is demonstrated on modern 193 nm wafer scanners.

Citation Download Citation

Peter Dirksen, Joseph J.M. Braat, Augustus J.E.M. Janssen, and Ad Leeuwestein "Aberration retrieval for high-NA optical systems using the extended Nijboer-Zernike theory", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.597406

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