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12 May 2005 Experimental measurements of diffraction for periodic patterns by 193-nm polarized radiation compared to rigorous EMF simulations
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Abstract
Polarization dependent diffraction efficiencies in transmission through gratings on specially designed masks with pitch comparable to the wavelength were measured using an angle-resolved scatterometry apparatus with a 193 nm excimer source. Four masks - two binary, one alternating and one attenuated phase shift mask - were included in the experimental measurements. The validity of models used in present commercially available simulation packages and additional polarization effects were evaluated against the experimental scattering efficiencies.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Marylyn Hoy Bennett, Andrew Grenville, Scott D. Hector, Shane R. Palmer, Leonardus H. A. Leunissen, Vicky Philipsen, Theodore M. Bloomstein, Dennis E. Hardy, Mordechai Rothschild, and James N. Hilfiker "Experimental measurements of diffraction for periodic patterns by 193-nm polarized radiation compared to rigorous EMF simulations", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.600098
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