Immersion lithography fluids for high NA 193 nm lithography

Jianming Zhou; Yongfa Fan; Anatoly Bourov; Neal Lafferty; Frank Cropanese; Lena Zavyalova; Andrew Estroff; Bruce W. Smith

doi:10.1117/12.602533

12 May 2004 Immersion lithography fluids for high NA 193 nm lithography

Jianming Zhou, Yongfa Fan, Anatoly Bourov, Neal Lafferty, Frank Cropanese, Lena Zavyalova, Andrew Estroff, Bruce W. Smith

Author Affiliations +

Proceedings Volume 5754, Optical Microlithography XVIII; (2004) https://doi.org/10.1117/12.602533
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Immersion lithography has become attractive since it can reduce critical dimensions by increasing numerical aperture (NA) beyond unity. Among all the candidates for immersion fluids, those with higher refractive indices are desired. However, for many of the fluids, the strong absorption at 193nm becomes a serious problem. Therefore, it is essential to find a fluid that is transparent enough (with absorbance less than 0.5mm^-1) and has high refractive index (above water, 1.44) at 193nm. Characterization of various fluid candidates has been performed and the absorbance of these fluids has been measured. To measure the absolute refractive index, a prism deviation angle method was developed. This method offers the possibility of measuring fluid refractive indices accurately. This paper also presents the obtained refractive indices of these fluids. Several candidates have been identified for 193nm application with refractive indices near 1.55, which is about 0.1 higher than that of water at this wavelength. Cauchy parameters of these fluids were generated and approaches were investigated to tailor the fluid absorption edges to be close to 193nm. The effects of these fluids on photoresist performance were also examined with 193nm immersion lithography exposure at various NA's. 1.5 NA was obtained to image 32nm lines with phosphoric acid as the immersion medium. These fluids are potential candidates for immersion lithography technology.

Citation Download Citation

Jianming Zhou, Jianming Zhou, Yongfa Fan, Yongfa Fan, Anatoly Bourov, Anatoly Bourov, Neal Lafferty, Neal Lafferty, Frank Cropanese, Frank Cropanese, Lena Zavyalova, Lena Zavyalova, Andrew Estroff, Andrew Estroff, Bruce W. Smith, Bruce W. Smith, } "Immersion lithography fluids for high NA 193 nm lithography", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.602533; https://doi.org/10.1117/12.602533

ACCESS THE FULL ARTICLE

PERSONAL SIGN IN
Full access may be available with your subscription

Email or Username Forgot your username?

Password Forgot your password?

Show

Remember Email/Username on this computer

Remember Password

No SPIE account? Create an account
or Institutional Sign In via Shibboleth

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $14.40

Non-members: $18.00 ADD TO CART

Show All Keywords

Keywords/Phrases

Search In:

Publication Years