12 May 2004 Polarization gratings for the DUV: modeling and experimental results
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Abstract
As lithographers push to extend optical lithography technologies to create smaller features with higher NA, especially immersion lithography, and lower k1 values, the polarization of the light in the illumination system becomes relevant. Nowadays the fabrication with electron-beam-lithography has the ability the produce diffractive structures for the DUV spectral range. We present binary phase gratings with polarization depended optical properties for 193nm designed with the rigorous coupled wave analysis (RCWA). The element function is based on a shift of the diffraction efficiencies between the first and the zero diffraction orders for different incident polarization angles. The properties of a 193nm polarizing phase grating will be discussed in detail. For TE-polarized light a zero order signal of less than 1% was measured. The efficiency for TE-polarized light in the first order is about 80%. For TM-polarized light the binary phase gratings achieve an efficiency of nearly 90% in the first and the zero order in transmission. The deflection angle of the first diffracted order can be varied between 14° and 40°. The rigorous modelling as well as the fabrication technology and optical measurements will be discussed.
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P. Triebel, D. Mademann, M. Schrenk, P. Weissbrodt, "Polarization gratings for the DUV: modeling and experimental results", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.598724; https://doi.org/10.1117/12.598724
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