Proximity matching for 193 nm scanner using scatterometry

WenZhan Zhou; Jin Yu; James Lo; Johnson Liu; Henry Tjhin; Thaddeus G. Dziura

doi:10.1117/12.601574

12 May 2005 Proximity matching for 193 nm scanner using scatterometry

WenZhan Zhou, Jin Yu, James Lo, Johnson Liu, Henry Tjhin, Thaddeus G. Dziura

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.601574
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

In this paper, we evaluate several approaches for proximity matching on a 193nm scanner system such as image contrast tuning, illumination tuning and photoresist tuning. Both experimental and simulation studies are carried out to reveal the differences between approaches. We find that it is very important to determine the root cause of proximity mismatch before attempting proximity matching, and that spectroscopic scatterometry is an excellent tool for OPC tuning

Citation Download Citation

WenZhan Zhou, Jin Yu, James Lo, Johnson Liu, Henry Tjhin, and Thaddeus G. Dziura "Proximity matching for 193 nm scanner using scatterometry", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.601574

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