Translator Disclaimer
12 May 2005 Quantum image-forming theory beyond diffraction limit
Author Affiliations +
Abstract
We formulate an image-forming optical theory of quantum lithography in which Entangled-photon pairs generated by spontaneous parametric down-conversion play an important role. Our optical system consists of an image-forming system, an illumination system with a second-order nonlinear medium, and two-photon absorbing materials. We evaluate the resolution of the quantum lithography system by using the optical transfer function and show a super-resolving condition which is, however, difficult to achieve.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Naoki Fukutake "Quantum image-forming theory beyond diffraction limit", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.598590
PROCEEDINGS
5 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

Photonic superguiding state
Proceedings of SPIE (October 28 1992)
Photodamage of Mg:Er:LiNbO3 crystal waveguide substrate
Proceedings of SPIE (October 19 2001)
Limitation on two-photon temporal correlation
Proceedings of SPIE (October 19 2004)
Beyond the Heisenberg uncertainty
Proceedings of SPIE (October 19 2004)

Back to Top