12 May 2004 Quantum image-forming theory beyond diffraction limit
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Abstract
We formulate an image-forming optical theory of quantum lithography in which Entangled-photon pairs generated by spontaneous parametric down-conversion play an important role. Our optical system consists of an image-forming system, an illumination system with a second-order nonlinear medium, and two-photon absorbing materials. We evaluate the resolution of the quantum lithography system by using the optical transfer function and show a super-resolving condition which is, however, difficult to achieve.
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Naoki Fukutake, Naoki Fukutake, "Quantum image-forming theory beyond diffraction limit", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.598590; https://doi.org/10.1117/12.598590
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