Simple microscale selective patterning on a single nanowire by using an optical microscope

Dong Jin Oh; Boone Won; Kang Hyun Kim; Gyu Tae Kim

doi:10.1117/12.599540

12 May 2005 Simple microscale selective patterning on a single nanowire by using an optical microscope

Dong Jin Oh, Boone Won, Kang Hyun Kim, Gyu Tae Kim

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.599540
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

A simple convenient way of forming a selective patterning on a single nanowire was demonstrated by using a conventional optical microscope. The fine resolution could reach approximately 5μm, which is enough to define electrode patterns on a single nanowire in a two-probe configuration. The photolithographic processes were carried out under the microscope with photoresist-coated substrate deposited by nanowires. Through the image capture and a proper configuration of the various home-made photomasks could produce a selective patterning on an individual nanowire successfully. Current-voltage characteristics of an individual GaN single nanowire were measured as a demonstration.

Citation Download Citation

Dong Jin Oh, Boone Won, Kang Hyun Kim, and Gyu Tae Kim "Simple microscale selective patterning on a single nanowire by using an optical microscope", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.599540

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