12 May 2004 Thirty years of lithography simulation
Author Affiliations +
Abstract
Thirty years ago Rick Dill and his team at IBM published the first account of lithography simulation - the accurate description of semiconductor optical lithography by mathematical equations. Since then, lithography simulation has grown dramatically in importance in four important areas: as a research tool, as a development tool, as a manufacturing tool, and as a learning tool. In this paper, the history of lithography simulations is traced from its roots to today’s indispensable tools for lithographic technology development. Along the way, an attempt will be made to define the true value of lithography simulation to the semiconductor industry.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chris A. Mack, "Thirty years of lithography simulation", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.601590; https://doi.org/10.1117/12.601590
PROCEEDINGS
12 PAGES


SHARE
RELATED CONTENT

OPC on a single desktop a GPU based OPC...
Proceedings of SPIE (April 02 2010)
Toward large-area simulation of e-beam lithography
Proceedings of SPIE (December 17 2003)
Chip-scale 3D topography synthesis
Proceedings of SPIE (June 29 1998)
Resist loss in 3D compact modeling
Proceedings of SPIE (March 13 2012)
Lithographic simulation: a review
Proceedings of SPIE (November 09 2001)

Back to Top