12 May 2004 Three-dimensional rigorous simulation of mask-induced polarization
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Abstract
The polarization induced by the mask is studied by using a 3D rigorous model, which solves Maxwell equations using the finite element method. The aerial image depends strongly on the change of polarization induced by the materials, thickness of the layer and pitch of the periodic masks.
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Xiuhong Wei, H. P. Urbach, Arthur Wachters, Yuri Aksenov, "Three-dimensional rigorous simulation of mask-induced polarization", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.597732; https://doi.org/10.1117/12.597732
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