Improving model-based OPC performance for the 65-nm node through calibration set optimization

Kyle Patterson; Yorick Trouiller; Kevin Lucas; Jerome Belledent; Amandine Borjon; Yves Rody; Christophe Couderc; Frank Sundermann; Jean-Christophe Urbani; Stanislas Baron

doi:10.1117/12.601166

5 May 2005 Improving model-based OPC performance for the 65-nm node through calibration set optimization

Kyle Patterson, Yorick Trouiller, Kevin Lucas, Jerome Belledent, Amandine Borjon, Yves Rody, Christophe Couderc, Frank Sundermann, Jean-Christophe Urbani, Stanislas Baron

Author Affiliations +

Proceedings Volume 5756, Design and Process Integration for Microelectronic Manufacturing III; (2005) https://doi.org/10.1117/12.601166
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

As lithography continues to increase in difficulty with low k1 factors, and ever-tighter process margins, model-based optical proximity correction (OPC) is being used for the majority of patterning layers. As a result, the engineering effort consumed by the development and calibration of OPC models is continuing to increase at an alarming rate. One of the major focal points of this effort is the increasing emphasis on improving the accuracy of the model-based OPC corrections. One of the major contributors to final OPC accuracy is the quality of the resist model. As a result of these trends, the number of sample points used to calibrate OPC models is increasing rapidly from generation to generation. However, this increase is largely due to an antiquated approach to the construction of these calibration sets, focusing on structure variations. In this study, a new approach to the calibration of a resist model will be proposed based upon the location of calibration structures within the actual resist space over which the resist model is expected to be predictive.

Citation Download Citation

Kyle Patterson, Kyle Patterson, Yorick Trouiller, Yorick Trouiller, Kevin Lucas, Kevin Lucas, Jerome Belledent, Jerome Belledent, Amandine Borjon, Amandine Borjon, Yves Rody, Yves Rody, Christophe Couderc, Christophe Couderc, Frank Sundermann, Frank Sundermann, Jean-Christophe Urbani, Jean-Christophe Urbani, Stanislas Baron, Stanislas Baron, } "Improving model-based OPC performance for the 65-nm node through calibration set optimization", Proc. SPIE 5756, Design and Process Integration for Microelectronic Manufacturing III, (5 May 2005); doi: 10.1117/12.601166; https://doi.org/10.1117/12.601166

ACCESS THE FULL ARTICLE

PERSONAL SIGN IN
Full access may be available with your subscription

Email or Username Forgot your username?

Password Forgot your password?

Show

Remember Email/Username on this computer

Remember Password

No SPIE account? Create an account
or Institutional Sign In via Shibboleth

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $14.40

Non-members: $18.00 ADD TO CART

Show All Keywords

Keywords/Phrases

Search In:

Publication Years