9 May 2005 Photoacoustic characterization of the mechanical properties of thin film materials
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Abstract
Two high frequency photoacoustic techniques were applied to investigate the mechanical properties of two sets of thin film materials in this work. Broadband photoacoustic guided-wave method was used to measure the guided-wave phase velocity dispersion curves of nano-structured diamond-like carbon hard coatings. The experimental velocity spectra were analyzed by a nonlinear optimization approach in conjunction with a multi-layer wave-propagation model. The derived Young’s moduli using the broadband photoacoustic technique were compared with line-focus acoustic microscopy and nano-indentation tests and good quantitative agreement is found. In a second set of experiments, ultra-thin two-layer aluminum and silicon nitride thin film materials were tested using the femtosecond transient pump-probe method using high frequency bulk waves generated by the ultra-fast laser pulses. The measured moduli of silicon nitride thin layers are in the range of 270 - 340 GPa. Photoacoustic methods are shown to be suitable for in-situ and non-destructive evaluation of the mechanical properties of thin films.
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Feifei Zhang, Sridhar Krishnaswamy, Dong Fei, Douglas A. Rebinsky, "Photoacoustic characterization of the mechanical properties of thin film materials", Proc. SPIE 5766, Testing, Reliability, and Application of Micro- and Nano-Material Systems III, (9 May 2005); doi: 10.1117/12.598028; https://doi.org/10.1117/12.598028
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