Paper
8 December 2004 Elimination of the half-wave hole for short-wave pass filter
Xiaofeng Ma, Yingjian Wang, Jianda Shao, Zhengxiu Fan
Author Affiliations +
Proceedings Volume 5774, Fifth International Conference on Thin Film Physics and Applications; (2004) https://doi.org/10.1117/12.608024
Event: Fifth International Conference on Thin Film Physics and Applications, 2004, Shanghai, China
Abstract
A few reasons to cause the half-wave hole for the short-wave pass filter had been analyzed. According to these reasons, the application of a new admittance-matching method and a photoelectric maximum control with half-wavelength effectively eliminated the half-wave hole. The matching stack consisted of a symmetrically periodic structure and provided a complete matching at the desired wavelength; i.e., both conditions for the equivalent admittance and phase thickness were fulfilled. Furthermore, both the theoretical and the tested curves had been given, and a good agreement between them was obtained.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiaofeng Ma, Yingjian Wang, Jianda Shao, and Zhengxiu Fan "Elimination of the half-wave hole for short-wave pass filter", Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); https://doi.org/10.1117/12.608024
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Transmittance

Refractive index

Ion beams

Optical filters

Reflectivity

Sputter deposition

Tantalum

RELATED CONTENT


Back to Top