Paper
8 December 2004 MBE growth and magnetoresistance properties of PrSrMnO3 films on NdGaO3(100) substrate
P. P. Chen, G. J. Liu, H. Makino, Wei Lu, Takafumi Yao
Author Affiliations +
Proceedings Volume 5774, Fifth International Conference on Thin Film Physics and Applications; (2004) https://doi.org/10.1117/12.607465
Event: Fifth International Conference on Thin Film Physics and Applications, 2004, Shanghai, China
Abstract
Pr1-xSrxMnO3 (100) thin films were prepared on NdGaO3 (100) substrate by RF-plasma-assisted molecular beam epitaxy method. The films were characterized by reflection high-energy electron diffraction, atomic force microscope and x-ray diffraction methods, indicating perfect surface smoothness and high crystalline quality. Large low field magnetoresistance effects with strong anisotropic properties of the non-stoichiometric (Pr1-xSrx)yMnO3 films have been observed. These results may be connected with the large A-site deficient in the films.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P. P. Chen, G. J. Liu, H. Makino, Wei Lu, and Takafumi Yao "MBE growth and magnetoresistance properties of PrSrMnO3 films on NdGaO3(100) substrate", Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); https://doi.org/10.1117/12.607465
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KEYWORDS
Thin films

Strontium

Magnetism

Resistance

Manganese

Crystals

Molecular beam epitaxy

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