8 December 2004 Research for polyimide as a sacrificial layer in MEMS device
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Proceedings Volume 5774, Fifth International Conference on Thin Film Physics and Applications; (2004) https://doi.org/10.1117/12.608035
Event: Fifth International Conference on Thin Film Physics and Applications, 2004, Shanghai, China
Abstract
Polyimide has been an important sacrificial layer material in the MEMS switch. Polyimide can be spun and photographied on silicon substrate. NaOH liquid can etch and develop polyimide. Then it needs to cure. After MEMS switch are manufactured, polyimide must be removed. The different cure temperature and time impacts the character of polyimide. The experiment result shows that it is easy to remove and can be lithographed. So it is suitable for microwave device. In this paper, refers that polyimide can be etched by NaOH, O2 and CF4.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Meili Hu, Meili Hu, Jinjin Chen, Jinjin Chen, Zhongshen Lai, Zhongshen Lai, Huibing Mao, Huibing Mao, Dexin Sheng, Dexin Sheng, } "Research for polyimide as a sacrificial layer in MEMS device", Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); doi: 10.1117/12.608035; https://doi.org/10.1117/12.608035
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