8 December 2004 The nanostructures and optical properties of ZnO films by RF magnetron sputtering
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Proceedings Volume 5774, Fifth International Conference on Thin Film Physics and Applications; (2004) https://doi.org/10.1117/12.607551
Event: Fifth International Conference on Thin Film Physics and Applications, 2004, Shanghai, China
Abstract
ZnO nano films were deposited on SiO2/P-Si (100) by RF magnetron sputtering. The interrelationships among growth conditions, crystal structures, and optical properties of the ZnO films were discussed. The reflection spectra of the films reveal that the band-gap of the films is between 3.2-3.3eV. The photoluminescence spectra provide further evidence for the relation between the green emission of ZnO films and the oxygen vacancy or Zn interstitial related defects. The results also demonstrate that the UV emission of ZnO is dependent on the size of the nano-crystallites forming the films. By comparing with the photoluminescence spectra at low temperature, the possible mechanism for this dependent relation was discussed.
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Bo Huang, Suntao Wu, Jing Li, Shigang Sun, and Zhong-Qun Tian "The nanostructures and optical properties of ZnO films by RF magnetron sputtering", Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); doi: 10.1117/12.607551; https://doi.org/10.1117/12.607551
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