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23 March 2005 Electrical parameters of RF-excited CO2 lasers in presence of magnetic field
Seyed Hassan Tavassoli; H. Latifi
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Proceedings Volume 5777, XV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; (2005) https://doi.org/10.1117/12.611020
Event: XV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 2004, Prague, Czech Republic
Abstract
Radio frequency capacitive discharges (RFCD) in the frequency range 1-200 MHz are widely used for gas lasers pumping. Magnetic field has an efficient effect on many plasma processes. When we apply a uniform magnetic field to a rf excited plasma, the electron mobility in direction perpendicular to the magnetic field is reduced. The reduction in the electron mobility leads to a decrease in drift velocity of electrons. In rf excited gas discharges thickness of sheaths is equal to amplitude of electron drift oscillations. So the reduction in the drift velocity of electrons leads to reduction in thickness of sheaths. As we know, small signal gain of active medium in rf excited CO2 lasers in bulk plasma region is much more than that in sheaths. Thus it can be concluded that applying magnetic field to rf excited CO2 lasers leads to an enhancement in thickness of positive column and output power. Experimental results show an external magnetic field leads to an increase in output power of rf excited CO2 lasers. Furthermore, in this paper we use a one dimensional model to show external magnetic field effects on some discharge parameters such as V-I characteristics, intensity of emitted light from plasma, impedance of sheaths and positive column of plasma for mixture of 10% CU2, 10% N2 and 80% He at pressure of 100 mbar theoretically.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Seyed Hassan Tavassoli and H. Latifi "Electrical parameters of RF-excited CO2 lasers in presence of magnetic field", Proc. SPIE 5777, XV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, (23 March 2005); https://doi.org/10.1117/12.611020
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