23 March 2005 Photo-etching of organic polymers using a laser plasma x-ray source based on a gas puff target irradiated with the PALS facility
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Proceedings Volume 5777, XV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; (2005) https://doi.org/10.1117/12.611333
Event: XV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 2004, Prague, Czech Republic
Abstract
Experiments on direct photo-etching of organic polymers induced by high-intensity nanosecond pulses of soft X-ray radiation from a laser plasma X-ray source based on a gas puff target are presented. X-rays in the wavelength range from about 1 nm to 8 nm were produced by irradiation of the xenon/helium double-stream gas puff target with laser pulses from the Prague Asterix Laser System (PALS). The resulting X-ray pulses were used to irradiate samples from organic polymers and form microstructures. The results show relatively high efficiency of X-ray direct photo-etching that could be useful for micromachining of organic polymers.
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Henryk Fiedorowicz, Andrzej Bartnik, Michal Bittner, Libor Juha, Josef Krasa, Pavel Kubat, Janusz Mikolajczyk, Rafal Rakowski, "Photo-etching of organic polymers using a laser plasma x-ray source based on a gas puff target irradiated with the PALS facility", Proc. SPIE 5777, XV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, (23 March 2005); doi: 10.1117/12.611333; https://doi.org/10.1117/12.611333
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