22 April 2005 Surface subwavelength structure and photonic device fabrication with temporally tailored multiple femtosecond laser pulses
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Proceedings Volume 5830, 13th International School on Quantum Electronics: Laser Physics and Applications; (2005) https://doi.org/10.1117/12.617180
Event: 13th International School on Quantum Electronics: Laser Physics and Applications, 2004, Bourgas, Bulgaria
Abstract
We have demonstrated the nanostructure fabrication on the Si surface by a 150 fs, 800 nm femtosecond laser pulse. The nanohole size of about 100 nm can be formed presumably by a near-field optical enhancement effect induced by the particle illumination. The nanohole size is nearly independent of the irradiated pulse number. It is found that the optical enhancement factor was about 7 in this experiment. The hexagonally arrayed nanoholes were fabricated. The diameter of the fabricated nanohole was about 90 nm and the depth was about 9 nm. In addition, using the double pulse fs laser, we demonstrated a low-loss waveguide fabrication in fused silica. A low-optical-loss waveguide is fabricated under the conditions that the first pulse energy and teh second pulse energy in the double pulse mode are 30 jJ and 160 jJ, respectively, nad the pulse time interval is 3 ps. The weak first pulse would act as a pre-conditioner of the fused silica and then the second subsequent pulse effectively induces the uniform refractive index change. This new femtosecond double pulse fabrication technique will be very promising for low-loss photonic device fabrication for photonic networks.
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Minoru Obara, Minoru Obara, Hiroto Takada, Hiroto Takada, Tetsuya Nagata, Tetsuya Nagata, Masanao Kamata, Masanao Kamata, } "Surface subwavelength structure and photonic device fabrication with temporally tailored multiple femtosecond laser pulses", Proc. SPIE 5830, 13th International School on Quantum Electronics: Laser Physics and Applications, (22 April 2005); doi: 10.1117/12.617180; https://doi.org/10.1117/12.617180
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