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7 June 2005 Plasma and chemical treatments of polyimide sacrificial layers in processing of microblolometers
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Proceedings Volume 5834, 18th International Conference on Photoelectronics and Night Vision Devices; (2005) https://doi.org/10.1117/12.628861
Event: 18th International Conference on Photoelectronics and Night Vision Devices and Quantum Informatics 2004, 2004, Moscow, Russian Federation
Abstract
Methods and objectives of plasma and chemical treatments of thin polyimide (Pt) coatings used as "sacrificial" layers in microbolometer processing have been analysed. Physical and chemical effects and mechanisms of surface plasma and chemical treatment of P1 layers and their anisotropic plasma etching with given wall sloping angles and from a gap have been integrated. Revealed mechanisms enabled to optimize P1 plasma and chemical treatment parameters in processing of microbolometer matrices of sizes 2x48, 160x120 and 320x240 pixels.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Petr G. Babaevsky, Andrey A. Zhukov, Svetlana A. Zhukova, and Yury S. Tchetverov "Plasma and chemical treatments of polyimide sacrificial layers in processing of microblolometers", Proc. SPIE 5834, 18th International Conference on Photoelectronics and Night Vision Devices, (7 June 2005); https://doi.org/10.1117/12.628861
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