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16 June 2005 Application data of the electron beam based photomask repair tool MeRiT MG
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Proceedings Volume 5835, 21st European Mask and Lithography Conference; (2005)
Event: 21st European Mask and Lithography Conference, 2005, Dresden, Germany
With the ever decreasing feature sizes and increasing cost of current and future photolithographic masks the repair of these masks becomes a substantial factor of the total mask production cost. In collaboration NaWoTec GmbH, Carl Zeiss Nano Technology Systems Division and Carl Zeiss Semiconductor Metrology Systems Division have launched a mask repair tool capable of processing a wide variety of mask types, such as quartz binary masks, phase shift masks, EUV masks, and e-beam projection stencil masks. In this paper, besides a brief overview of the tool platform, we will present the automated repair of clear and opaque defects on Cr and MoSi quartz masks. Emphasis will be put onto the resolution and the speed of the repair procedure and the high grade of automation and integration achievable in the repair of highend photomasks. An outlook against the ITRS requirements and the extendibility of the presented solution to further technology nodes will be given in the summary.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christian Ehrlich, Klaus Edinger, Volker Boegli, and Peter Kuschnerus "Application data of the electron beam based photomask repair tool MeRiT MG", Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005);


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