16 June 2005 Gaussian beam writing strategy: accuracy of using the shape beam simulator SELID for Gaussian beam systems
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Proceedings Volume 5835, 21st European Mask and Lithography Conference; (2005) https://doi.org/10.1117/12.637286
Event: 21st European Mask and Lithography Conference, 2005, Dresden, Germany
Abstract
Obtaining highly aggressive resolution with E-Beam direct writing needs accurate simulation tools. SIGMA-C software SELIDTM allows simulating patterns profiles transferred into a resist film in the case of a Shaped Beam system. However EBeam tools that allow achieving very high resolution, especially for dense patterns, are Gaussian Beam systems. This article deals with the comparison of experimental lines obtained with a Gaussian Beam writing system and with simulation by SELIDTM of such lines. A negative chemically amplified photo resist (NEB22, Sumitomo) was exposed by our Leica UHR 100 keV. By using a high beam step size with a Gaussian spot 5 nm of FWHM (Full Width at Half Maximum), we showed that Shaped Beam simulations obtained with SELIDTM are accurate compared to experiments.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. H. Tortai, J. H. Tortai, J. Thiault, J. Thiault, R. Tiron, R. Tiron, L. Mollard, L. Mollard, Stephan Haefele, Stephan Haefele, Sergey Vychub, Sergey Vychub, John Lewellen, John Lewellen, Peter Brooker, Peter Brooker, } "Gaussian beam writing strategy: accuracy of using the shape beam simulator SELID for Gaussian beam systems", Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005); doi: 10.1117/12.637286; https://doi.org/10.1117/12.637286
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