16 June 2005 High productivity object-oriented defect detection algorithms for the new modular die-to-database reticle inspection platform
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Proceedings Volume 5835, 21st European Mask and Lithography Conference; (2005) https://doi.org/10.1117/12.637300
Event: 21st European Mask and Lithography Conference, 2005, Dresden, Germany
Abstract
The paper presents a description of one of the main elements of a new modular automatic reticle defect inspection platform-a defect detection sub-system. This platform is currently under active development at Planar Concern. This paper presents the results of the use of the object-oriented approach which was used in the development of the defect detection algorithms for the die-to-database reticle inspection system. Furthermore, the paper presents briefly the architecture and technology of the new modular automatic reticle inspection platform.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Syarhei Avakaw, "High productivity object-oriented defect detection algorithms for the new modular die-to-database reticle inspection platform", Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005); doi: 10.1117/12.637300; https://doi.org/10.1117/12.637300
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