16 June 2005 Lithography trends based on projections of the ITRS (Invited Paper)
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Proceedings Volume 5835, 21st European Mask and Lithography Conference; (2005) https://doi.org/10.1117/12.637301
Event: 21st European Mask and Lithography Conference, 2005, Dresden, Germany
Abstract
The microelectronic industry has gone through an enormous technical evolution in the last four decades. Both the tech-nological and economic challenges of microelectronics were increasing consistently in the past few years. This paper discusses the future trends in micro- and nano-technologies with special emphasis on lithography. The trends of minia-turization will be sketched with reference to the International Technology Roadmap for Semiconductors (ITRS). After a description of general trends in technology node timing, an overview will be given on the future lithography require-ments and the technical solutions including options for post-optical lithography as, for example, Extreme UV.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wolfgang Arden, "Lithography trends based on projections of the ITRS (Invited Paper)", Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005); doi: 10.1117/12.637301; https://doi.org/10.1117/12.637301
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