16 June 2005 Lithography trends based on projections of the ITRS (Invited Paper)
Author Affiliations +
Proceedings Volume 5835, 21st European Mask and Lithography Conference; (2005) https://doi.org/10.1117/12.637301
Event: 21st European Mask and Lithography Conference, 2005, Dresden, Germany
Abstract
The microelectronic industry has gone through an enormous technical evolution in the last four decades. Both the tech-nological and economic challenges of microelectronics were increasing consistently in the past few years. This paper discusses the future trends in micro- and nano-technologies with special emphasis on lithography. The trends of minia-turization will be sketched with reference to the International Technology Roadmap for Semiconductors (ITRS). After a description of general trends in technology node timing, an overview will be given on the future lithography require-ments and the technical solutions including options for post-optical lithography as, for example, Extreme UV.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wolfgang Arden, Wolfgang Arden, } "Lithography trends based on projections of the ITRS (Invited Paper)", Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005); doi: 10.1117/12.637301; https://doi.org/10.1117/12.637301
PROCEEDINGS
7 PAGES


SHARE
Back to Top