Mask modeling in the low k1 and ultrahigh NA regime: phase and polarization effects

Andreas Erdmann

doi:10.1117/12.637285

16 June 2005 Mask modeling in the low k₁ and ultrahigh NA regime: phase and polarization effects (Invited Paper)

Andreas Erdmann

Proceedings Volume 5835, 21st European Mask and Lithography Conference; (2005) https://doi.org/10.1117/12.637285
Event: 21st European Mask and Lithography Conference, 2005, Dresden, Germany

Abstract

This paper reviews state of the art mask modeling for optical lithography. Rigorous electromagnetic field (EMF) simu-lation of light diffraction from optical masks is compared to the traditional assumption of an infinitely thin mask, the so called Kirchhoff approach. Rigorous EMF simulation will be employed to analyze mask polarization phenomena which become important in the ultrahigh NA regime. Several important lithographic phenomena, which can be explained only with rigorous EMF simulation, are discussed. This includes the printability of small assist features, intensity imbalanc-ing for alternating PSM, and process window deformations. The paper concludes with a discussion on material issues and algorithmic extensions which will be necessary for an accurate modeling of future mask technology.

Citation Download Citation

Andreas Erdmann "Mask modeling in the low k₁ and ultrahigh NA regime: phase and polarization effects (Invited Paper)", Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005); https://doi.org/10.1117/12.637285

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