7 June 2005 Influence of laser pulse duration on microstructuring of silicon surface
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Proceedings Volume 5850, Advanced Laser Technologies 2004; (2005) https://doi.org/10.1117/12.633680
Event: Advanced Laser Technologies 2004, 2004, Rome and Frascati, Italy
Abstract
The paper proposes an approach to classification of different types of laser-induced surface micro-structures. The approach is based on the relation between different ranges of laser pulse duration and determinant mechanisms of micro-structuring including thermo-mechanical, optical and electrical effects. Detailed analysis of kinetics of silicon surface micro-structuring in millisecond range and consideration of polariton mechanism of microstructuring in nanosecond range resulted in assumption, that inhomogeneous electrical field must be the determinant factor for micro-structuring in femtosecond range.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
G. D. Shandybina, G. D. Shandybina, G. M. Martsinovsky, G. M. Martsinovsky, S. M. Sarnakov, S. M. Sarnakov, } "Influence of laser pulse duration on microstructuring of silicon surface", Proc. SPIE 5850, Advanced Laser Technologies 2004, (7 June 2005); doi: 10.1117/12.633680; https://doi.org/10.1117/12.633680
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