28 June 2005 A prospective modular platform of the mask pattern automatic inspection using the die-to-database method
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Proceedings Volume 5853, Photomask and Next-Generation Lithography Mask Technology XII; (2005) https://doi.org/10.1117/12.617305
Event: Photomask and Next Generation Lithography Mask Technology XII, 2005, Yokohama, Japan
Abstract
The paper presents a description of a new modular automatic reticle defect inspection platform and also a description of one of the main elements of this platform - a defect detection sub-system. This platform is currently under active development at Planar Concern. This paper presents the results of the use of the object-oriented approach which was used in the development of the defect detection algorithms for the die-to-database reticle inspection system. Furthermore, the paper presents briefly the architecture and technology of the new modular automatic reticle inspection platform.
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Syarhei Avakaw, Syarhei Avakaw, Aliaksandr Korneliuk, Aliaksandr Korneliuk, Alena Tsitko, Alena Tsitko, } "A prospective modular platform of the mask pattern automatic inspection using the die-to-database method", Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); doi: 10.1117/12.617305; https://doi.org/10.1117/12.617305
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