Effectiveness of mask data process using OASIS format

Katsuji Tabara; Mitsuo Sakurai; Seiji Makino; Takahisa Itoh; Tomoyuki Okada

doi:10.1117/12.617148

28 June 2005 Effectiveness of mask data process using OASIS format

Katsuji Tabara, Mitsuo Sakurai, Seiji Makino, Takahisa Itoh, Tomoyuki Okada

Proceedings Volume 5853, Photomask and Next-Generation Lithography Mask Technology XII; (2005) https://doi.org/10.1117/12.617148
Event: Photomask and Next Generation Lithography Mask Technology XII, 2005, Yokohama, Japan

Abstract

OASIS(Open Artwork System Interchange Standard) format was investigated for various logic device datas. In this investigation, the change in the processing time of the confirmation of the content of compression in OASIS and the mask data processing were confirmed. OASIS format has higher data compressibility than other methods, and its compressibility is independent on the data size. It is very effective in a advanced technology device according to the above-nentioned investigations. In data storage and data handling, applying after OPC processing is quite effective.

Citation Download Citation

Katsuji Tabara, Mitsuo Sakurai, Seiji Makino, Takahisa Itoh, and Tomoyuki Okada "Effectiveness of mask data process using OASIS format", Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); https://doi.org/10.1117/12.617148

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