Exploring the fundamental limit of CD control: shot noise and CD uniformity improvement through resist thickness

Ming L. Yu; Allan Sagle; Benny Buller

doi:10.1117/12.617058

28 June 2005 Exploring the fundamental limit of CD control: shot noise and CD uniformity improvement through resist thickness

Ming L. Yu, Allan Sagle, Benny Buller

Author Affiliations +

Proceedings Volume 5853, Photomask and Next-Generation Lithography Mask Technology XII; (2005) https://doi.org/10.1117/12.617058
Event: Photomask and Next Generation Lithography Mask Technology XII, 2005, Yokohama, Japan

Abstract

We have observed that increasing the thickness of the resist can improve the critical dimension uniformity (CDU) in electron beam lithography. This is our first experimental demonstration that increasing the acid generation in the resist by incident electrons is a pathway to reduce the effect of shot noise on CDU. The measurements were made with our Quadra raster shaped beam lithography system. The resist was REAP 200, a chemically amplified resist. The thicknesses were 200, 300 and 600 nm. The phenomenon is consistent with our model prediction that there would be a reduction of the shot-noise-induced CDU as the number of acid molecules generated in the chemically amplified resist increased with the resist thickness. We used the model to estimate the acid generation efficiency and the resist blur. We have also observed deviations from this trend in the thick resist (600 nm) suggesting complexity that may not be explained by the model. We are continuing our investigation to confirm these preliminary results.

Citation Download Citation

Ming L. Yu, Allan Sagle, and Benny Buller "Exploring the fundamental limit of CD control: shot noise and CD uniformity improvement through resist thickness", Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); https://doi.org/10.1117/12.617058

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available