28 June 2005 Image placement of large window-size membrane for EPL and LEEPL mask
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Proceedings Volume 5853, Photomask and Next-Generation Lithography Mask Technology XII; (2005) https://doi.org/10.1117/12.617287
Event: Photomask and Next Generation Lithography Mask Technology XII, 2005, Yokohama, Japan
Abstract
Large window-size membranes for stencil masks are required to increase the throughput of electron projection lithography (EPL) and low-energy electron projection lithography (LEEPL). In this paper, image placement (IP) accuracy and methodology for correcting stress-induced distortions on 4 X EPL masks are addressed. Although the average of local IP errors (| mean | + 3σ) for reference features across an entire 1mm-window EPL mask is 13.4 nm, the average of errors across an entire 4mm-window EPL mask increases to 20.4 nm, which could be reduced to the required budget with further study on EB writing accuracy or IP corrections. In addition we evaluate local IP errors on 4mm-window mask due to pattern gradients by measuring the placement errors at the edge of dense hole arrays. Applying the correction for stress-induced distortions to EB data, we can reduce the placement errors for dense features to 4.6 nm, which is less than the 10 nm budget allocated for 4mm-window EPL mask at the half-pitch features of 45 nm node. For the global IP, only the measurement repeatability of 7.8 nm contributes to the global IP budget measuring all the global position over an entire 4mm-window EPL mask. And we can meet the required global IP budget. Finally, IP accuracy for a single membrane is also presented, showing the IP error is 24.5 nm (| mean | + 3σ), which compares with that of COSMOS type LEEPL mask. Methodology of measuring the position data on a single membrane, however, remains to be developed.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hideyuki Eguchi, Hideyuki Eguchi, Tomoya Sumida, Tomoya Sumida, Takashi Susa, Takashi Susa, Yoshiyuki Negishi, Yoshiyuki Negishi, Toshiaki Kurosu, Toshiaki Kurosu, Takashi Yoshii, Takashi Yoshii, Tsukasa Yamazaki, Tsukasa Yamazaki, Kenta Yotsui, Kenta Yotsui, Hiroshi Sugimura, Hiroshi Sugimura, Akira Tamura, Akira Tamura, } "Image placement of large window-size membrane for EPL and LEEPL mask", Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); doi: 10.1117/12.617287; https://doi.org/10.1117/12.617287
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