Photomask lifetime issues in ArF lithography

Florence Eschbach; Peter Coon; Barbara Greenebaum; Anurag Mittal; Peter Sanchez; Daniel Tanzil; Grace Ng; Henry Yun; Archita Sengupta

doi:10.1117/12.617078

28 June 2005 Photomask lifetime issues in ArF lithography

Florence Eschbach, Peter Coon, Barbara Greenebaum, Anurag Mittal, Peter Sanchez, Daniel Tanzil, Grace Ng, Henry Yun, Archita Sengupta

Author Affiliations +

Proceedings Volume 5853, Photomask and Next-Generation Lithography Mask Technology XII; (2005) https://doi.org/10.1117/12.617078
Event: Photomask and Next Generation Lithography Mask Technology XII, 2005, Yokohama, Japan

Abstract

Photomask lifetime has become a challenge since the introduction of high volume manufacturing 193nm photolithograph. Photomask lifetime is being impacted by a broad range of environmental and process factors resulting in inorganics crystals and organic contaminants formation as well as pellicle lifetime issues. Extensive work has been published on strategies for reduction of inorganic crystals photoinduced defects formation mainly focusing on photomask clean process improvements. This paper will focus on identifying root causes for photoinduced contaminants forming within the pellicle space area as well as identify environmental factors which have the potential of impacting pellicle membrane longevity. Outgasing experiments coupled with 193nm laser exposure tests were conducted to decouple and rank reticle/pellicle storage materials as well as pellicle outgasing contributors to photoinduced defects and identify factors impacting pellicle membrance longevity. Analytical test were conducted to compare the relative levels of reticle storage materials and pellicle outgasing contaminants. Experiments aimed at quantifying the fab environment contribution to photoinduced defects formation and impact on pellicle membrane lifetime will be discussed. Environmental conditions minimizing external contributing factors impacting photomask front side photoinduced defects formation and pellicle membrance longevity will be suggested.

Citation Download Citation

Florence Eschbach, Peter Coon, Barbara Greenebaum, Anurag Mittal, Peter Sanchez, Daniel Tanzil, Grace Ng, Henry Yun, and Archita Sengupta "Photomask lifetime issues in ArF lithography", Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); https://doi.org/10.1117/12.617078

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available