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28 June 2005 Second level printing of advanced phase shift masks using DUV laser lithography
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Proceedings Volume 5853, Photomask and Next-Generation Lithography Mask Technology XII; (2005) https://doi.org/10.1117/12.617357
Event: Photomask and Next Generation Lithography Mask Technology XII, 2005, Yokohama, Japan
Abstract
Laser lithography tools have been a staple in the photomask industry for second level printing for several years. This paper explores the overlay capabilities of the Alta4300D Deep UV (DUV) lithography system. The tool is manufactured by ETEC Systems, a part of the Mask Business Group of Applied Materials. The tool demonstrates good overlay performance, and an improved data path ensures the ability to handle large file sizes without an adverse impact on writing time. In addition to actual performance data on product masks, a simple analysis of the maximum total edge placement error of a hypothetical two level alt-PSM process is presented. The results show the tool is capable for many advanced phase shift overlay applications.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Charles Howard, Keun-Taek Park, Marcus Scherer, Svetomir Stankovic, Rusty Cantrell, and Mark Herrmann "Second level printing of advanced phase shift masks using DUV laser lithography", Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); https://doi.org/10.1117/12.617357
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