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28 June 2005 The unified mask data format based on OASIS for VSB EB writers
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Proceedings Volume 5853, Photomask and Next-Generation Lithography Mask Technology XII; (2005) https://doi.org/10.1117/12.617423
Event: Photomask and Next Generation Lithography Mask Technology XII, 2005, Yokohama, Japan
Abstract
We have developed a unified mask data format named “OASIS.VSB” for Variable-Shaped-Beam (VSB) EB writers. OASIS.VSB is the mask data format based on OASIS released as a successive format to GDSII by SEMI. We have defined restrictions on OASIS for VSB EB writers to input OASIS.VSB data directly to VSB EB writers just like the native EB data. We confirmed there was no large problem in OASIS.VSB as the unified mask data format through the evaluation results. The latest version of OASIS.VSB specification has been disclosed to the public in 2005.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Toshio Suzuki, Junji Hirumi, Yutaka Hojyo, Yuichi Kawase, Shinji Sakamoto, Koki Kuriyama, Syogo Narukawa, and Morihisa Hoga "The unified mask data format based on OASIS for VSB EB writers", Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); https://doi.org/10.1117/12.617423
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