Translator Disclaimer
13 June 2005 Development of measurement of microstructure using moire topography in SEM
Author Affiliations +
Abstract
The novel precise three dimensional shape measurement method using SEM and moire topography has been proposed. The possibility for measurement of wave length order by this method has also been shown. In this paper, the method with high resolution power based on the new measurement method is proposed by employing the fringe scanning technology for the shadow moire. The optical system is constructed with SEM using backscattering electrons, the grating holder which can shift the position of the grating, and the grating of which the pitch is 120 micro meter. Measurement using a bearing ball as a sample showed that the high resolution measurement around one macro meter can be performed by introducing the fringe scanning method to the new measurement.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yasuhiko Arai and Shunsuke Yokozeki "Development of measurement of microstructure using moire topography in SEM", Proc. SPIE 5856, Optical Measurement Systems for Industrial Inspection IV, (13 June 2005); https://doi.org/10.1117/12.612442
PROCEEDINGS
7 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

Ultralow-energy imaging for metrology
Proceedings of SPIE (June 07 1998)
New type of x ray source for lensless laboratory nano...
Proceedings of SPIE (September 02 2010)
Analogies between neutron and gamma-ray imaging
Proceedings of SPIE (August 29 2006)
3 D measurement method based on wavelet transform by using...
Proceedings of SPIE (November 16 2008)
3D measurement method based on wavelet transform by using SEM
Proceedings of SPIE (September 10 2009)

Back to Top