Development of measurement of microstructure using moiré topography in SEM

Yasuhiko Arai; Shunsuke Yokozeki

doi:10.1117/12.612442

13 June 2005 Development of measurement of microstructure using moire topography in SEM

Yasuhiko Arai, Shunsuke Yokozeki

Proceedings Volume 5856, Optical Measurement Systems for Industrial Inspection IV; (2005) https://doi.org/10.1117/12.612442
Event: Optical Metrology, 2005, Munich, Germany

Abstract

The novel precise three dimensional shape measurement method using SEM and moire topography has been proposed. The possibility for measurement of wave length order by this method has also been shown. In this paper, the method with high resolution power based on the new measurement method is proposed by employing the fringe scanning technology for the shadow moire. The optical system is constructed with SEM using backscattering electrons, the grating holder which can shift the position of the grating, and the grating of which the pitch is 120 micro meter. Measurement using a bearing ball as a sample showed that the high resolution measurement around one macro meter can be performed by introducing the fringe scanning method to the new measurement.

Citation Download Citation

Yasuhiko Arai and Shunsuke Yokozeki "Development of measurement of microstructure using moire topography in SEM", Proc. SPIE 5856, Optical Measurement Systems for Industrial Inspection IV, (13 June 2005); https://doi.org/10.1117/12.612442

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