13 June 2005 Focal spot measurement in ultra-intense ultra-short pulse laser facility
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Abstract
A peak power of 286-TW Ti:sapphire laser facility referred to as SILEX-I was successfully built at China Academy of Engineering Physics, for a pulse duration of 30 fs in a three-stage Ti:sapphire amplifier chain based on chirped-pulse amplification. The beam have a wavefront distortion of 0.63μm PV and 0.09μm RMS, and the focal spot with an f/2.2 OAP is 5.7μm, to our knowledge, this is the best far field obtained for high-power ultra-short pulse laser systems with no deformable mirror wavefront correction. The peak focused intensity of ~1021W /cm2 were expected.
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Lanqin Liu, Hansheng Peng, Kainan Zhou, Xiaodong Wang, Xiaoming Zeng, Qihua Zhu, Xiaojun Huang, Xiaofeng Wei, and Huan Ren "Focal spot measurement in ultra-intense ultra-short pulse laser facility", Proc. SPIE 5856, Optical Measurement Systems for Industrial Inspection IV, (13 June 2005); doi: 10.1117/12.611993; https://doi.org/10.1117/12.611993
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