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18 August 2005 Construction and testing of wavefront reference sources for interferometry of ultra-precise imaging systems
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Abstract
We have built and calibrated a set of 532-nm wavelength wavefront reference sources that fill a numerical aperture of 0.3. Early data show that they have a measured departure from sphericity of less than 0.2 nm RMS (0.4 milliwaves) and a reproducibility of better than 0.05 nm rms. These devices are compact, portable, fiber-fed, and are intended as sources of measurement and reference waves in wavefront measuring interferometers used for metrology of EUVL optical elements and systems. Keys to wave front accuracy include fabrication of an 800-nm pinhole in a smooth reflecting surface as well as a calibration procedure capable of measuring axisymmetric and non-axisymmetric errors.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael A. Johnson, Donald W. Phillion, Gary E. Sommargren, Todd A. Decker, John S. Taylor, Yoshio Gomei, Osamu Kakuchi, and Seiji Takeuchi "Construction and testing of wavefront reference sources for interferometry of ultra-precise imaging systems", Proc. SPIE 5869, Optical Manufacturing and Testing VI, 58690P (18 August 2005); doi: 10.1117/12.623185; https://doi.org/10.1117/12.623185
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