Reverse optimization of a Shack-Hartmann wavefront sensor

Daniel G. Smith; John E. Greivenkamp

doi:10.1117/12.618190

19 August 2005 Reverse optimization of a Shack-Hartmann wavefront sensor

Daniel G. Smith, John E. Greivenkamp

Author Affiliations +

Proceedings Volume 5869, Optical Manufacturing and Testing VI; 586915 (2005) https://doi.org/10.1117/12.618190
Event: Optics and Photonics 2005, 2005, San Diego, California, United States

Abstract

Reverse optimization has been used in other metrology instruments to obtain good calibration results. This paper describes three approaches for using reverse optimization with a Shack-Hartmann wavefront sensor. Two of the approaches give some insight into problems encountered in reverse optimization and a third approach, involving an aberration function model of the Shack-Hartmann wavefront sensor, resolves these issues. Simulated results are given and the approach is shown to produce calibrated wavefront measurements accurate to one part in one thousand, in the presence of significant centroid noise.

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Daniel G. Smith and John E. Greivenkamp "Reverse optimization of a Shack-Hartmann wavefront sensor", Proc. SPIE 5869, Optical Manufacturing and Testing VI, 586915 (19 August 2005); https://doi.org/10.1117/12.618190

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