Correlation between mechanical stress and optical properties of SiO2/Ta2O5 multilayer UV narrow-bandpass filters deposited by plasma ion-assisted deposition

Jue Wang; Robert L. Maier

doi:10.1117/12.613285

19 August 2005 Correlation between mechanical stress and optical property of SiO₂/Ta₂O5 multilayer UV narrow band filter deposited by plasma ion-assisted deposition

Jue Wang, Robert L. Maier

Author Affiliations +

Proceedings Volume 5870, Advances in Thin-Film Coatings for Optical Applications II; 58700E (2005) https://doi.org/10.1117/12.613285
Event: Optics and Photonics 2005, 2005, San Diego, California, United States

Abstract

Multilayer SiO₂/Ta₂O5 UV narrow-bandpass filters were deposited by a plasma ion-assisted process. The optimized PIAD process leads to densified multilayer coatings with a stabilized build-in compressive stress and un-shifted center wavelength. The correlation between stress reduction and center wavelength upward shift was established via post-deposition annealing at temperature ranging from 120 ^oC to 500 ^oC. Following 300 ^oC annealing, increased porosity and physical thickness of single layers of Ta₂O5 and SiO₂ were observed, via EMA modeling of ellipsometric data acquired around the quasi-Brewster angle. This is consistent with AFM measurement. The CWL upward shift was attributed to the micro-structural changes originating from intrinsic stress relaxation. Good agreement between the calculated CWL shift based on single layer test, and measured total CWL shift of the UV NBF suggests that the multilayer interfacial coupling effects might be ignorable for CWL shift and stress calculations.

Citation Download Citation

Jue Wang and Robert L. Maier "Correlation between mechanical stress and optical property of SiO₂/Ta₂O5 multilayer UV narrow band filter deposited by plasma ion-assisted deposition", Proc. SPIE 5870, Advances in Thin-Film Coatings for Optical Applications II, 58700E (19 August 2005); https://doi.org/10.1117/12.613285

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