19 August 2005 Correlation between mechanical stress and optical property of SiO2/Ta2O5 multilayer UV narrow band filter deposited by plasma ion-assisted deposition
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Abstract
Multilayer SiO2/Ta2O5 UV narrow-bandpass filters were deposited by a plasma ion-assisted process. The optimized PIAD process leads to densified multilayer coatings with a stabilized build-in compressive stress and un-shifted center wavelength. The correlation between stress reduction and center wavelength upward shift was established via post-deposition annealing at temperature ranging from 120 oC to 500 oC. Following 300 oC annealing, increased porosity and physical thickness of single layers of Ta2O5 and SiO2 were observed, via EMA modeling of ellipsometric data acquired around the quasi-Brewster angle. This is consistent with AFM measurement. The CWL upward shift was attributed to the micro-structural changes originating from intrinsic stress relaxation. Good agreement between the calculated CWL shift based on single layer test, and measured total CWL shift of the UV NBF suggests that the multilayer interfacial coupling effects might be ignorable for CWL shift and stress calculations.
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Jue Wang, Jue Wang, Robert L. Maier, Robert L. Maier, } "Correlation between mechanical stress and optical property of SiO2/Ta2O5 multilayer UV narrow band filter deposited by plasma ion-assisted deposition", Proc. SPIE 5870, Advances in Thin-Film Coatings for Optical Applications II, 58700E (19 August 2005); doi: 10.1117/12.613285; https://doi.org/10.1117/12.613285
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