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25 August 2005 Using multi-function components to solve optical design challenges for DUV microlithographic applications
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Abstract
Several small-field catadioptric optical designs have been developed over the last decade to meet the demanding needs from lithographers. Design solutions that use a multi-function component can provide nearly perfect wavefront correction for optical systems with broad bandwidth sources, such as free running (un-narrowed) excimer lasers operating at wavelengths below 300 nm, with limited choices of optical materials with high transmission at these wavelengths. From these catadioptric design forms, variations have been developed to accommodate changes in wavelength, increases in the numerical aperture and conversion of the imaging medium from nitrogen to ultra-high purity water and other high index fluids for immersion lithography applications. Some designs also address the need for increased working distance. This paper will discuss the use of multi-function components, the evolution of several design forms, the optical materials required, their benefits for specific applications, and the challenges they have created.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James E. Webb "Using multi-function components to solve optical design challenges for DUV microlithographic applications", Proc. SPIE 5874, Current Developments in Lens Design and Optical Engineering VI, 587401 (25 August 2005); https://doi.org/10.1117/12.618034
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