19 August 2005 Remaining challenges in microlithographic optical design
Author Affiliations +
Proceedings Volume 5874, Current Developments in Lens Design and Optical Engineering VI; 58740N (2005); doi: 10.1117/12.620615
Event: Optics and Photonics 2005, 2005, San Diego, California, United States
Abstract
Rayleigh scaling equations for resolution and the control of computer chip critical dimensions (CD) within a finite depth of focus (DOF) have always indicated that resolution is better improved by reductions in wavelength of exposure light rather than by increasing the numerical aperture (NA) of the projection optics, particularly as it approaches the physical limit in air of 1.0. However, liquid immersion of the image increases the physical NA limits and presents new optical design challenges, while postponing the necessity for drastic reductions in the wavelength.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David M. Williamson, "Remaining challenges in microlithographic optical design", Proc. SPIE 5874, Current Developments in Lens Design and Optical Engineering VI, 58740N (19 August 2005); doi: 10.1117/12.620615; https://doi.org/10.1117/12.620615
PROCEEDINGS
12 PAGES


SHARE
KEYWORDS
Semiconducting wafers

Liquids

Monochromatic aberrations

Refractor telescopes

Reticles

Optical design

Lithography

Back to Top