Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies II
Jul 31 - Aug 4 2005
San Diego, California, United States
Nano- and Micrometrology
Proc. SPIE 5878, Sub-pixel spatial resolution micro-roughness measurements with interlaced stitching, 587801(31 August 2005);doi: 10.1117/12.617651
Proc. SPIE 5878, Application of a positioning and measuring machine for metrological long-range scanning force microscopy, 587802(31 August 2005);doi: 10.1117/12.620882
Proc. SPIE 5878, Determination of sub-micrometer high aspect ratio grating profiles, 587803(31 August 2005);doi: 10.1117/12.617714
Proc. SPIE 5878, 3D surface profilometry for both static and dynamic nanoscale full field characterization of AFM micro cantilever beams, 587804(31 August 2005);doi: 10.1117/12.614683
Proc. SPIE 5878, In-line characterization of silicon nano-crystals grown on high-K tunnel dielectrics, 587805(1 September 2005);doi: 10.1117/12.616820
Interferometry, Profilometry, and Photometry I
Proc. SPIE 5878, Characterizing lateral resolution of interferometers: the Height Transfer Function (HTF), 587806(31 August 2005);doi: 10.1117/12.614311
Proc. SPIE 5878, Multifunctional interferometric platform for static and dynamic MEMS measurement, 587807(1 September 2005);doi: 10.1117/12.616840
Proc. SPIE 5878, Phase shifting mask as a precision instrument for characterizing image-forming optical systems, 587808(18 August 2005);doi: 10.1117/12.612751
Interferometry, Profilometry, and Photometry II
Proc. SPIE 5878, Traceable multiple sensor system for absolute form measurement, 58780A(31 August 2005);doi: 10.1117/12.614726
Proc. SPIE 5878, Monte Carlo analysis for the determination of conic constant of an aspheric micro lens based on a scanning white light interferometric measurement, 58780B(1 September 2005);doi: 10.1117/12.617528
Proc. SPIE 5878, Vibration measurement of MEMS by digital laser microinterferometer, 58780C(19 August 2005);doi: 10.1117/12.617592
Proc. SPIE 5878, Uncertainties in aspheric profile measurements with the geometry measuring machine at NIST, 58780D(18 August 2005);doi: 10.1117/12.615398
Material and Thin Film Characterization
Proc. SPIE 5878, Investigating the ArF laser stability of CaF2 at elevated fluences, 58780E(31 August 2005);doi: 10.1117/12.616904
Proc. SPIE 5878, A fast genetic algorithm to fully characterize transparent-film-absorbing-substrate systems using ellipsometry, 58780F(1 September 2005);doi: 10.1117/12.620665
Proc. SPIE 5878, New configuration of channeled spectropolarimeter for snapshot polarimetric measurement of materials, 58780H(31 August 2005);doi: 10.1117/12.616298
Proc. SPIE 5878, Thin film thickness determination using reflected spectrum sampling, 58780I(18 August 2005);doi: 10.1117/12.613197
Proc. SPIE 5878, Application of the photoelastic tomography to three-dimensional measurement of birefringence in anisotropic microobjects, 58780J(18 August 2005);doi: 10.1117/12.613044
Wafer Inspection, CD, and Grating Metrology
Proc. SPIE 5878, Improvement in total measurement uncertainty for gate CD control, 58780M(19 August 2005);doi: 10.1117/12.616344
Proc. SPIE 5878, Polarization of diffraction by reflection gratings, 58780N(31 August 2005);doi: 10.1117/12.613936
Laser Metrology
Proc. SPIE 5878, Lifetime estimation of InGaAlP lasers under different operating conditions, 58780Q(31 August 2005);doi: 10.1117/12.613917
Scatter Techniques for Challenging Applications
Proc. SPIE 5878, Light scatter metrology of diamond turned optics, 58780R(31 August 2005);doi: 10.1117/12.613779
Proc. SPIE 5878, Automated three-axis gonioreflectometer for computer graphics applications, 58780S(18 August 2005);doi: 10.1117/12.617589
Proc. SPIE 5878, Scatter analysis of optical components from 193 nm to 13.5 nm, 58780T(31 August 2005);doi: 10.1117/12.616423
Proc. SPIE 5878, Rough surface characterization and comparison of scatter measurements and models, 58780U(19 August 2005);doi: 10.1117/12.613780
Proc. SPIE 5878, An experimental study of the correlation between surface roughness and light scattering for rough metallic surfaces, 58780V(31 August 2005);doi: 10.1117/12.617637
Scatter and Diffraction Theories
Proc. SPIE 5878, Spectral redistribution from the interference of a Collett-Wolf source, 58780W(31 August 2005);doi: 10.1117/12.613269
Proc. SPIE 5878, Young’s interference pattern formed with symmetrical partially coherent sources, 58780X(24 August 2005);doi: 10.1117/12.613272
Proc. SPIE 5878, Transmission of light through a metal film with two corrugated surfaces, 58780Z(31 August 2005);doi: 10.1117/12.620384
Proc. SPIE 5878, Pseudo-nondiffraction from the interference of a pair of symmetric Collett-Wolf beams, 587810(19 August 2005);doi: 10.1117/12.613935
Nanostructure, Defect, and Particle Detection I
Proc. SPIE 5878, Characterization of drop-on-demand printed conductive silver tracks, 587812(31 August 2005);doi: 10.1117/12.614861
Proc. SPIE 5878, Surface texture investigation of ultra-precision optical components, 587813(1 September 2005);doi: 10.1117/12.616500
Proc. SPIE 5878, Structural characterisation of semiconductors by computer methods of image analysis, 587814(18 August 2005);doi: 10.1117/12.616982
Nanostructure, Defect, and Particle Detection II
Proc. SPIE 5878, Surface QC by low-cost far-field nanoscopy, 587815(19 August 2005);doi: 10.1117/12.611188
Proc. SPIE 5878, Amplitude contrast image enhancement in digital holography for particles analysis, 587817(1 September 2005);doi: 10.1117/12.613297
Proc. SPIE 5878, Radiation thermometry for silicon wafers, 587819(1 September 2005);doi: 10.1117/12.613857
Proc. SPIE 5878, Specific photometer for large coated optics, 58781A(1 September 2005);doi: 10.1117/12.613900
Proc. SPIE 5878, Measurement of point-spread function (PSF) for confocal fluorescence microscopy, 58781B(1 September 2005);doi: 10.1117/12.616701
Proc. SPIE 5878, Design and implementation of high-performance and cost-effective white-light interferometric profile measurement systems, 58781C(24 August 2005);doi: 10.1117/12.616765
Proc. SPIE 5878, Design and development of multifunctional confocal laser scanning microscope with UV/VIS laser source, 58781D(24 August 2005);doi: 10.1117/12.616637
Proc. SPIE 5878, Effect of exposure intensity on the photochemical reaction speed of the lithography for thick film resists, 58781G(1 September 2005);doi: 10.1117/12.619210
Wafer Inspection, CD, and Grating Metrology
Proc. SPIE 5878, Calculation of effective impedance of polycrystals in weak magnetic fields, 58780O(31 August 2005);doi: 10.1117/12.626615
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