A fast genetic algorithm to fully characterize transparent-film-absorbing-substrate systems using ellipsometry

A. R. M. Zaghloul; Y. A. Zaghloul

doi:10.1117/12.620665

31 August 2005 A fast genetic algorithm to fully characterize transparent-film-absorbing-substrate systems using ellipsometry

A. R. M. Zaghloul, Y. A. Zaghloul

Author Affiliations +

Proceedings Volume 5878, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies II; 58780F (2005) https://doi.org/10.1117/12.620665
Event: Optics and Photonics 2005, 2005, San Diego, California, United States

Abstract

We show that only one measurement of the ellipsometric function ρ at one angle of incidence and one wavelength is totally sufficient to determine the optical constant of the filmN₁, its thickness d, and the substrate optical constant N₂. Obviously, it's also sufficient to only characterize the film; determine N₁ and d, and to only characterize the substrate; determine N₂ and d. A genetic algorithm (GA) is presented that is based on a physical condition of the film-substrate system. This GA is used to characterize the system in those three separate cases. We show that by removing the film thickness from the fitness function of the GA, the computational effort to characterize the film is reduced from 20 000 to 69 calculations. And that to characterize an absorbing layer is reduced from 80 000 to 180. An error analysis is presented that shows the GA is resilient to random experimental errors.

Citation Download Citation

A. R. M. Zaghloul and Y. A. Zaghloul "A fast genetic algorithm to fully characterize transparent-film-absorbing-substrate systems using ellipsometry", Proc. SPIE 5878, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies II, 58780F (31 August 2005); https://doi.org/10.1117/12.620665

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