Application of the photoelastic tomography to three-dimensional measurement of birefringence in anisotropic microobjects

Pawel Kniazewski; Tomasz Kozacki; Malgorzata Kujawinska

doi:10.1117/12.613044

18 August 2005 Application of the photoelastic tomography to three-dimensional measurement of birefringence in anisotropic microobjects

Pawel Kniazewski, Tomasz Kozacki, Malgorzata Kujawinska

Author Affiliations +

Proceedings Volume 5878, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies II; 58780J (2005) https://doi.org/10.1117/12.613044
Event: Optics and Photonics 2005, 2005, San Diego, California, United States

Abstract

In the paper we present method for three-dimensional measurement of birefringence distribution in photonics components. The tool we used in this work is automated digital photoelasticity combined with tomography, namely photoelastic tomography. Till now the photoelasticity procedures have been applied for objects with significant dimensions and therefore the diffraction phenomena could be neglected. In this paper we verify the correctness of this method for measurement of small objects. In order to identify this error we simulate the measurement process starting from integrated retardation determination and ending on 3D distribution evaluation. Computations are performed using full vectorial propagation method based on Maxwell-curl equations (finite difference time domain method FDTD). The results of simulations are compared with actual measurement results derived from physical setup. The result of experimental and numerical analysis allow optimizing the measurement setup and minimizing the errors. The correctness of the photoelastic tomography for analysis of microobjects has been proven on an example of birefringent optical fibers.

Citation Download Citation

Pawel Kniazewski, Tomasz Kozacki, and Malgorzata Kujawinska "Application of the photoelastic tomography to three-dimensional measurement of birefringence in anisotropic microobjects", Proc. SPIE 5878, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies II, 58780J (18 August 2005); https://doi.org/10.1117/12.613044

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