18 August 2005 Surface QC by low-cost far-field nanoscopy
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Abstract
This paper reviews work undertaken in the last few years aimed at developing low-cost technology to bridge the gap between subjective visual inspection of specular surfaces and costly objective methods. Since all measurement relies on comparison with a standard the approach adopted is that of the comparison microscope where controlled specimen illumination is used in conjunction with imaging procedures designed to achieve maximum sensitivity to the surface height variations expected. As height variations down to nanometres can be measured with a surface clearance of some millimetres the technology has been termed "Far-Field Nanoscopy". Advantage has been taken of the current wide availability of low-cost digital cameras and associated image processing software. It will be shown how the principal surface metrics of form and finish including roughness, waviness and imperfections can be addressed.
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Lionel Baker, Lionel Baker, } "Surface QC by low-cost far-field nanoscopy", Proc. SPIE 5878, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies II, 587815 (18 August 2005); doi: 10.1117/12.611188; https://doi.org/10.1117/12.611188
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