18 August 2005 Multi-angle generalized ellipsometry of anisotropic optical structures
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A new technique for simultaneous multi-angle ellipsometric measurements of anisotropic optical structures such as films used in the display industry is introduced. A very small area on the sample is illuminated with a focused beam which after it interacts with the sample and is polarization analyzed is spread across a CCD. Each pixed collects light from a different angle incident on the sample allowing data collection at numerous incident angles simultaneously. The small but significant polarization aberrations of the microscope objectives provide a significant challenge to accurate measurement A mathematical description of the ellipsometric technique is presented. The optical properties of two biaxial samples, a stretched plastic retarder element used for correcting angle of incident effects in LC displays, and a thin layer of E-type polarizing dried liquid crystal material are measured and maps of the ellipsometric parameters Ψ and ▵ as a function incident and azimuthal angles are presented. Data from both samples are reduced using an iterative algorithm with a biaxial thin film modeling software package to compute all three principle components of the dielectric tensor as well as it's orientation.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Neil A. Beaudry, Neil A. Beaudry, Yanming Zhao, Yanming Zhao, Russell Chipman, Russell Chipman, "Multi-angle generalized ellipsometry of anisotropic optical structures", Proc. SPIE 5888, Polarization Science and Remote Sensing II, 588808 (18 August 2005); doi: 10.1117/12.618163; https://doi.org/10.1117/12.618163


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