Progress in quantum lithography

Robert W. Boyd; Hye Jeong Chang; Heedeuk Shin; Colin O'Sullivan-Hale

doi:10.1117/12.617683

14 September 2005 Progress in quantum lithography

Robert W. Boyd, Hye Jeong Chang, Heedeuk Shin, Colin O'Sullivan-Hale

Proceedings Volume 5893, Quantum Communications and Quantum Imaging III; 58930G (2005) https://doi.org/10.1117/12.617683
Event: Optics and Photonics 2005, 2005, San Diego, California, United States

Abstract

We review our progress toward implementing the proposal of Boto et al. (Phys. Rev. Lett. 85, 2733-2736, 2000) for using entangled photons to increase the spatial resolution of the process of interferometric photolithography beyond that of the standard Rayleigh limit.

Citation Download Citation

Robert W. Boyd, Hye Jeong Chang, Heedeuk Shin, and Colin O'Sullivan-Hale "Progress in quantum lithography", Proc. SPIE 5893, Quantum Communications and Quantum Imaging III, 58930G (14 September 2005); https://doi.org/10.1117/12.617683

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