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14 September 2005 Progress in quantum lithography
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Abstract
We review our progress toward implementing the proposal of Boto et al. (Phys. Rev. Lett. 85, 2733-2736, 2000) for using entangled photons to increase the spatial resolution of the process of interferometric photolithography beyond that of the standard Rayleigh limit.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert W. Boyd, Hye Jeong Chang, Heedeuk Shin, and Colin O'Sullivan-Hale "Progress in quantum lithography", Proc. SPIE 5893, Quantum Communications and Quantum Imaging III, 58930G (14 September 2005); https://doi.org/10.1117/12.617683
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