14 September 2005 Progress in quantum lithography
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Abstract
We review our progress toward implementing the proposal of Boto et al. (Phys. Rev. Lett. 85, 2733-2736, 2000) for using entangled photons to increase the spatial resolution of the process of interferometric photolithography beyond that of the standard Rayleigh limit.
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Robert W. Boyd, Robert W. Boyd, Hye Jeong Chang, Hye Jeong Chang, Heedeuk Shin, Heedeuk Shin, Colin O'Sullivan-Hale, Colin O'Sullivan-Hale, } "Progress in quantum lithography", Proc. SPIE 5893, Quantum Communications and Quantum Imaging III, 58930G (14 September 2005); doi: 10.1117/12.617683; https://doi.org/10.1117/12.617683
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