14 September 2005 Progress in quantum lithography
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We review our progress toward implementing the proposal of Boto et al. (Phys. Rev. Lett. 85, 2733-2736, 2000) for using entangled photons to increase the spatial resolution of the process of interferometric photolithography beyond that of the standard Rayleigh limit.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert W. Boyd, Robert W. Boyd, Hye Jeong Chang, Hye Jeong Chang, Heedeuk Shin, Heedeuk Shin, Colin O'Sullivan-Hale, Colin O'Sullivan-Hale, "Progress in quantum lithography", Proc. SPIE 5893, Quantum Communications and Quantum Imaging III, 58930G (14 September 2005); doi: 10.1117/12.617683; https://doi.org/10.1117/12.617683


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