Paper
1 September 2005 Shaping of thin grazing-incidence reflection grating substrates via magnetorheological finishing
Ralf K. Heilmann, Mireille Akilian, Chi-Hao Chang, Robert Hallock, Ed Cleaveland, Mark L. Schattenburg
Author Affiliations +
Abstract
Reflection gratings offer high dispersion and thus the potential for high spectral resolution in the soft x-ray band. The requirements of high efficiency and maximum collecting area at minimum mass lead to the desire for densely stacked and exquisitely flat thin-foil grating substrates. In the past we have successfully addressed the problems of thin substrate figure metrology and blazed grating profile fabrication. Our recently developed low-stress thin-foil metrology truss with 50 nm figure repeatability removed a metrology bottleneck and allows us to make progress in the shaping of thin-foil substrates. We present results on the figuring of 100 mm-diameter silicon wafers via magnetorheological finishing to a flatness below 100 nm peak-to-valley, allowing for sub-arcsecond reflection optics.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ralf K. Heilmann, Mireille Akilian, Chi-Hao Chang, Robert Hallock, Ed Cleaveland, and Mark L. Schattenburg "Shaping of thin grazing-incidence reflection grating substrates via magnetorheological finishing", Proc. SPIE 5900, Optics for EUV, X-Ray, and Gamma-Ray Astronomy II, 590009 (1 September 2005); https://doi.org/10.1117/12.617788
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Cited by 5 scholarly publications.
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KEYWORDS
Semiconducting wafers

Magnetorheological finishing

Metrology

Wafer-level optics

Silicon

Polishing

X-ray telescopes

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